Fraunhofer Institute for Surface Engineering and Thin Films ISTLong Beach, California, USA / April 27, 2019 - May 02, 2019
SVC TechCon 2019
Booth number: 427
The SVC TechCon takes place for the 62nd time this year. The conference is an important meeting place for experts from the field of vacuum coating technologies and materials. As part of the two-day technical exhibition and in addition to more than 150 other exhibitors, the Fraunhofer IST will present the latest results in the field of HIPIMS technology and optical coatings. The following topics will be presented in the area of simulation:
- Dust particle simulation
- 3D medium frequency simulation
- Monitoring system MOCCA+®
You can visit the Fraunhofer IST at the following exhibition times:
Tuesday, April 30, 2019, 11:00 a.m. - 5:00 p.m.
Wednesday, May 1, 2019, 10:00 a.m. - 4:00 p.m.
As in previous years, the Fraunhofer IST participates in the scientific program of the conference with numerous contributions:
Monday, April 29, 2019
Session: Coatings for Energy Conversion and Related Processes
Chair: Volker Sittinger
SPECIAL EVENT - Technology Forum Breakfast
7:00 am - 8:15 am, Room 102-B
”High Power Impulse Magnetron Sputtering (HIPIMS)”
Arutin Ehiasarian, Ralf Bandorf
EDUCATION PROGRAM - Full Day Tutorial
9:30 am - 17:30 pm, C-333
”Practice and Applications of High Power Impulse Magnetron Sputtering”
Arutin Ehiasarian, Ralf Bandorf
Tuesday, April 30, 2019
SPECIAL EVENT - Technology Forum Breakfast
7:00 am - 8:15 am, Room 103-A
”Modern Coating Sources”
Frank Papa, Ralf Bandorf
7:00 am - 8:15 am, Room 103-A
”Process Control and Process Monitoring”
Holger Gerdes, Mike Miller
8:30 am - 9:10 am, Room 104-A
”Sustainability Through Data-Driven Computational Production and Life Cycle Engineering”
Prof. Dr. Christoph Herrmann
Coatings and surface engineering are essential enablers for sustainable products and processes. They have the potential to drastically reduce environmental impacts per functional unit. A holistic approach is required to support engineering decisions from a system perspective and to avoid problem shifting. Such a holistic approach on the one hand spans from process and machine level to factory level. On the other hand, the entire life cycle from raw material extraction, production and use to disassembly and recycling needs to be considered. Furthermore, methods and tools are necessary to allow a comprehensive environmental assessment while being able to handle the system complexity without extensive iterations or rough simplifications. Here, digitization of product and processes enables new data-driven computational approaches in production and life cycle engineering. In production engineering, e.g. cyber-physical -systems can support the selection of process parameters to optimize energy and resource efficiency by using the cyber part as a safe platform for testing new parameter combinations. In life cycle engineering, modular and flexible tools can compute environmental impacts related to the introduction of new technologies, while considering different use scenarios and external factors. In addition, methods from visual analytic become a key element to involve different stakeholders and to support decision-making processes with respect to sustainability targets.
”Self-Sustaining Cleaning Technology for Safe Water Supply and Management in Rural African Areas ´SafeWaterAfrica´”
V. Sittinger, L. Schäfer, J. Gäbler, M. Höfer, G. Bräuer, R.J. Bond, T. Matthée, D. Brackemeyer, J. Wilsenach, M. Woods
Water will increasingly become a limited resource and the supply of which will become a major restriction to the future socio-economic development of countries in Africa. This includes both the amount of water available and the quality of what is available. At present, many resources are polluted by industrial effluents, domestic and commercial sewage, acid mine drainage, agricultural runoff and litter. Due to this, a new method for water decontamination is required. One such method is water purification by means of the degradation of contaminants by strong oxidants which are produced electrochemically from the water molecules in the aqueous solution to be treated. This technology of electrochemical advanced oxidation processes by means of diamond electrodes for use in water purification has been previously developed. However, to date only specific large-scale industrial/commercial applications have been developed. Based on the knowledge gained in previous projects, a diamond electrode based water purification system was developed which was tailored according to the particular needs of the target African groups in rural regions of Mozambique and South Africa. Furthermore, a new seeding technique on large area Silicon substrates prior to the diamond deposition will be shown. With the produced diamond electrodes, in addition to tailored solutions in the fields of water disinfection, waste water treatment, and electrochemical synthesis, a low cost, easy-to-handle and solar-powered water purification solution for the decentralized water treatment and supply of safe water in the rural and peri-urban areas of southern African countries will be shown.
Wednesday, May 1, 2019
Session: Fundamental Aspects of Coatings
Chair: Holger Gerdes
10:00 am, JT2
”Maximizing SiH3 Radical Concentration During HWCVD Si:H Film Production by Means of Wire Temperature and Deposition Pressure Tuning”
Hunter King, Kai Ortner, Tino Harig, Markus Höfer, Volker Sittinger
A simulation of gas phase chemistry near the wire surface in a hot-wire chemical vapor deposition (HWCVD) chamber, which utilizes an array of tungsten wires and silane (SiH4) as a process gas, with hydrogen (H2), phosphine (PH3), and diborane (B2H6) as additional gasses, was made. SiH3 radical partial pressures were simulated as a function of wire temperature and deposition pressure for given gas inlet compositions in order to attempt to maximize these radicals, as they lead to higher quality and more ordered Si:H films. An attempt to confirm the simulation results through a series of depositions using a 10 x 0.5 mm tungsten wire array providing a deposition area of 500 x 600 mm2 was made. Wire temperatures, H2gas flows, and process pressures were varied in an attempt to produce the highest quality Si:H film as measured through Raman crystallinity measurements, XRD grain size measurements, and EPMA impurity analysis. The results from the experimental sets are then compared to the simulation theory.
Session: High Power Impulse Magnetron Sputtering - HIPIMS
”HIPIMS Deposition of Advanced DLC Coatings for Sensor and Tribological Applications”
Ralf Bandorf, Holger Gerdes, David Märtins, Maria Grein, Sima Hellmers, Jonathan Rösler, Michael Vergöhl, Günter Bräuer
Diamond-like carbon (DLC) films are well established in tribological applications. Besides the excellent friction and wear properties, electrical properties of DLC are studied, e.g. for the use as strain sensor. While the industrial use of DLC is widespread, there is still technological advancement in the deposition technologies to further improve and tailor the coating properties. High power impulse magnetron sputtering (HIPIMS) offers additional flexibility for the deposition. Recent developments like the use of a positive reversal pulse serve as remote biasing, especially for insulating substrates.
This paper will discuss improvement of DLC coatings when using HIPIMS on different examples. The potential and properties of hard and smooth amorphous carbon coatings (t)a-C by the use of a HIPIMS-Arc mixed mode will be presented. For metal doped DLC (a-C:H:Me) examples will be given both, for tribological and sensor properties. The films are deposited either by unipolar HIPIMS or with additional positive reversal (kick) pulse.
Donnerstag, 2. Mai 2019
SPECIAL EVENT - Technology Forum Breakfast
7:00 - 8:15 Uhr, Room 102-C
”Coatings for Thin Film Photovoltaics”
Dr. Volker Sittinger
”Microwave Plasma Assisted Chemical Vapor Deposition of SiOx Films”
Holger Gerdes, Ralf Bandorf, Rolf Schäfer, Thomas Schütte, Michael Vergöhl, Günter Bräuer
SiOx is part of many optical and electrical applications. In optical applications, SiOx is often used as low-index material and in electrical applications as insulator. In both cases, a defect-free deposition is essential. CVD processes are favored in industrial applications due to their higher deposition rates compared to reactive sputtering. Especially microwave excitation offers a great tool for very high deposition rates.
Therefore, this presentation will focus on microwave processes depositing SiOx films with HMDSO as precursor gas. The influence of the working pressure, the amount of reactive gas, the source power on the plasma and film properties will be discussed. Optical emission spectroscopy was used to determine the plasma properties. The films were characterized with respect to hardness, electrical breakdown voltage, and optical properties. Furthermore, SEM investigations show the topography and morphology of the films.