Messen und Ausstellungen

Zum bereits 62. Mal findet die SVC TechCon in diesem Jahr statt. Die Konferenz ist ein wichtiger Treffpunkt für Experten aus dem Bereich der Vakuumbeschichtungstechnologien und -materialien. Das Fraunhofer IST präsentiert im Rahmen der zweitägigen technischen Ausstellung und neben mehr als 150 weiteren Ausstellern die neuesten Ergebnisse zur HIPIMS-Technologie und zu optischen Schichten. Aus dem Bereich der Simulation werden folgende Themen vorgestellt:

• Staubpartikelsimulation
• 3D-Mittelfrequenz-Simulation
• Monitoringsystem MOCCA+^®

Sie können das Fraunhofer IST zu den folgenden Ausstellungszeiten besuchen:

Dienstag, 30. April 2019, 11:00 - 17:00 Uhr
Mittwoch, 1. Mai 2019, 10:00 - 16:00 Uhr

Am wissenschaftlichen Programm der Konferenz beteiligt sich das Fraunhofer IST wie in den vergangenen Jahren mit zahlreichen Beiträgen:

 

Montag, 29. April 2019

 

Session: Coatings for Energy Conversion and Related Processes

Chair: Volker Sittinger

 

SPECIAL EVENT - Technology Forum Breakfast

7:00 - 8:15 Uhr, Room 102-B

»High Power Impulse Magnetron Sputtering (HIPIMS)«

Arutin Ehiasarian, Ralf Bandorf

 

EDUCATION PROGRAM - Full Day Tutorial

9:30 - 17:30 Uhr, C-333

»Practice and Applications of High Power Impulse Magnetron Sputtering«

Arutin Ehiasarian, Ralf Bandorf

 

Dienstag, 30. April 2019

 

SPECIAL EVENT - Technology Forum Breakfast

7:00 - 8:15 Uhr,  Room 103-A

»Modern Coating Sources«

Frank Papa, Ralf Bandorf

 

7:00 - 8:15 Uhr, Room 103-A

»Process Control and Process Monitoring«

Holger Gerdes, Mike Miller

 

Keynote Lecture

8:30 - 9:10 Uhr, Room 104-A

»Sustainability Through Data-Driven Computational Production and Life Cycle Engineering«

Prof. Dr. Christoph Herrmann

Coatings and surface engineering are essential enablers for sustainable products and processes. They have the potential to drastically reduce environmental impacts per functional unit. A holistic approach is required to support engineering decisions from a system perspective and to avoid problem shifting. Such a holistic approach on the one hand spans from process and machine level to factory level. On the other hand, the entire life cycle from raw material extraction, production and use to disassembly and recycling needs to be considered. Furthermore, methods and tools are necessary to allow a comprehensive environmental assessment while being able to handle the system complexity without extensive iterations or rough simplifications. Here, digitization of product and processes enables new data-driven computational approaches in production and life cycle engineering. In production engineering, e.g. cyber-physical -systems can support the selection of process parameters to optimize energy and resource efficiency by using the cyber part as a safe platform for testing new parameter combinations. In life cycle engineering, modular and flexible tools can compute environmental impacts related to the introduction of new technologies, while considering different use scenarios and external factors. In addition, methods from visual analytic become a key element to involve different stakeholders and to support decision-making processes with respect to sustainability targets.

 

10:00 Uhr, SYM3

»Self-Sustaining Cleaning Technology for Safe Water Supply and Management in Rural African Areas ›SafeWaterAfrica‹«

V. Sittinger, L. Schäfer, J. Gäbler, M. Höfer, G. Bräuer, R.J. Bond, T. Matthée, D. Brackemeyer, J. Wilsenach, M. Woods

Water will increasingly become a limited resource and the supply of which will become a major restriction to the future socio-economic development of countries in Africa. This includes both the amount of water available and the quality of what is available. At present, many resources are polluted by industrial effluents, domestic and commercial sewage, acid mine drainage, agricultural runoff and litter. Due to this, a new method for water decontamination is required. One such method is water purification by means of the degradation of contaminants by strong oxidants which are produced electrochemically from the water molecules in the aqueous solution to be treated. This technology of electrochemical advanced oxidation processes by means of diamond electrodes for use in water purification has been previously developed. However, to date only specific large-scale industrial/commercial applications have been developed. Based on the knowledge gained in previous projects, a diamond electrode based water purification system was developed which was tailored according to the particular needs of the target African groups in rural regions of Mozambique and South Africa. Furthermore, a new seeding technique on large area Silicon substrates prior to the diamond deposition will be shown. With the produced diamond electrodes, in addition to tailored solutions in the fields of water disinfection, waste water treatment, and electrochemical synthesis, a low cost, easy-to-handle and solar-powered water purification solution for the decentralized water treatment and supply of safe water in the rural and peri-urban areas of southern African countries will be shown.

 

Mittwoch, 1. Mai 2019

 

Session: Fundamental Aspects of Coatings

Chair: Holger Gerdes

 

10:00 Uhr, JT2

»Maximizing SiH₃ Radical Concentration During HWCVD Si:H Film Production by Means of Wire Temperature and Deposition Pressure Tuning«

Hunter King, Kai Ortner, Tino Harig, Markus Höfer, Volker Sittinger

A simulation of gas phase chemistry near the wire surface in a hot-wire chemical vapor deposition (HWCVD) chamber, which utilizes an array of tungsten wires and silane (SiH₄) as a process gas, with hydrogen (H₂), phosphine (PH₃), and diborane (B₂H₆) as additional gasses, was made. SiH₃ radical partial pressures were simulated as a function of wire temperature and deposition pressure for given gas inlet compositions in order to attempt to maximize these radicals, as they lead to higher quality and more ordered Si:H films. An attempt to confirm the simulation results through a series of depositions using a 10 x 0.5 mm tungsten wire array providing a deposition area of 500 x 600 mm² was made. Wire temperatures, H₂ gas flows, and process pressures were varied in an attempt to produce the highest quality Si:H film as measured through Raman crystallinity measurements, XRD grain size measurements, and EPMA impurity analysis. The results from the experimental sets are then compared to the simulation theory.

 

Session: High Power Impulse Magnetron Sputtering - HIPIMS

11:40 Uhr, HP10

»HIPIMS Deposition of Advanced DLC Coatings for Sensor and Tribological Applications«

Ralf Bandorf, Holger Gerdes, David Märtins, Maria Grein, Sima Hellmers, Jonathan Rösler, Michael Vergöhl, Günter Bräuer

Diamond-like carbon (DLC) films are well established in tribological applications. Besides the excellent friction and wear properties, electrical properties of DLC are studied, e.g. for the use as strain sensor. While the industrial use of DLC is widespread, there is still technological advancement in the deposition technologies to further improve and tailor the coating properties. High power impulse magnetron sputtering (HIPIMS) offers additional flexibility for the deposition. Recent developments like the use of a positive reversal pulse serve as remote biasing, especially for insulating substrates.

This paper will discuss improvement of DLC coatings when using HIPIMS on different examples. The potential and properties of hard and smooth amorphous carbon coatings (t)a-C by the use of a HIPIMS-Arc mixed mode will be presented. For metal doped DLC (a-C:H:Me) examples will be given both, for tribological and sensor properties. The films are deposited either by unipolar HIPIMS or with additional positive reversal (kick) pulse.

 

Donnerstag, 2. Mai 2019

 

SPECIAL EVENT - Technology Forum Breakfast

7:00 - 8:15 Uhr, Room 102-C

»Coatings for Thin Film Photovoltaics«

Dr. Volker Sittinger

 

17:00 Uhr, PP8

»Microwave Plasma Assisted Chemical Vapor Deposition of SiO_x Films«

Holger Gerdes, Ralf Bandorf, Rolf Schäfer, Thomas Schütte, Michael Vergöhl, Günter Bräuer

SiO_x is part of many optical and electrical applications. In optical applications, SiO_x is often used as low-index material and in electrical applications as insulator. In both cases, a defect-free deposition is essential. CVD processes are favored in industrial applications due to their higher deposition rates compared to reactive sputtering. Especially microwave excitation offers a great tool for very high deposition rates.

Therefore, this presentation will focus on microwave processes depositing SiO_x films with HMDSO as precursor gas. The influence of the working pressure, the amount of reactive gas, the source power on the plasma and film properties will be discussed. Optical emission spectroscopy was used to determine the plasma properties. The films were characterized with respect to hardness, electrical breakdown voltage, and optical properties. Furthermore, SEM investigations show the topography and morphology of the films.