Inline system with 7 compartments for the deposition of silicon and silicon nitride coatings with hot-wire chemical vapour deposition.
Our technologies in the field of CVD
At the Fraunhofer IST, various chemical vapor deposition (CVD) processes are available. In addition to a variety of hot-wire-activated CVD processes, we are also able to offer our customers atomic layer deposition (ALD) and plasma-activated CVD processes. Depending on the task and application, the processes offer specific advantages. Please do not hesitate to contact us!
Fraunhofer Institute for Surface Engineering and Thin Films IST