Conference  /  April 17, 2023  -  April 19, 2023

11th International Conference on Hot-Wire Chemical Vapor Deposition (11th HWCVD)

The 11th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD) will take place this year at Forschungszentrum Jülich. The newest applications, developments and research results of Hot-Wire CVD, Catalytic CVD, and iCVD will be presented. Experts from industry and research will meet to discuss the status and future pathways of this technology. Topical areas will include all aspects of HWCVD from Fundamentals, Processing, Materials to Structures, Applications and Commercialization.

This year, the Fraunhofer IST is again participating in the scientific programme of the conference with several contributions. In the following we give you an overview of all the institute's participations:  

 

Talks

 

April 17, 2023, 12:20 AM

Dr.-Ing. Sarah Baron

»Thin, smooth and uniform HFCVD-diamond films for antireflective coatings« 

 

April 18, 2023, 3:00 PM (Invited Talk)

Dr. Volker Sittinger

»Investigation of silicon films for heterojunction solar cells and MEMS deposited by hot-wire CVD« 

 

April 19, 2023, 11:30 AM

Dr. Markus Höfer

»Optimization of HWCVD Process Conditions for the Deposition of Silicon Nitride Coatings with Specific Properties«