Plasma and energy flux diagnostics in HiPIMS discharges
Caroline Adam, Kiel University
Alpha-Alumina Thin Films at Low Temperature by Reactive HiPIMS
Celia Dieudonne, Institute of condensate matter of bordeaux
HIPIMS – as an enabler for next steps in tool, decorative and functional applications
Philipp Immich, IHI Hauzer Techno Coating
I-V-characteristics and drifts – glows, arcs and HiPIMS discharges: A few historical remarks
Holger Kersten, Kiel University
New insights into HiPIMS discharges from particle-based simulations
Tomas Kozak, University of West Bohemia in Pilsen
Reactive triple-cathode high power impulse magnetron sputtering co-deposition of C–Cr–Zr films
YU-TANG YIN, National Formosa University
Superior HiPIMS-deposited AlCrN coatings for a wide range of cutting applications
Biljana Mesic, CemeCon AG
Phase transition control using Reactive bipolar HiPIMS, application to tantalum nitride and original transition metal nitride alloys
Julien Neyrat, Safran
Deposition of Indium Gallium Zinc Oxide film for thin-film transistor by HiPIMS
Takayuki Ohta, Meijo University
Time-resolved optical emission spectroscopy of material transport during the sputtering of a compound NbC target by HiPIMS
Andrea Pajdarová, University of West Bohemia in Pilsen
Tuning HIPIMS processes in real-time by pulse-resolved spectroscopic and electrical plasma process control
Thomas Schütte, PLASUS GmbH
Optimized HiPIMS-Deposited TiAlSiN Coatings: Tailoring Deposition Parameters for Superior Machining of Inconel 718
Sumit Rajput, Indian Institute of Technology Madras
Performance Enhancement of Single layered Brazed cBN Grinding Wheel using HiPIMS-deposited TiAlSiN coating
Bandana Priyadarshini, Indian Institute of Technology Madras
Tool Life and Quality of Holes in Micro-Drilling of SS316 Steel by HiPIMS-TiAlSiN Coated Carbide Tools
Abhishek Shrivastava, Indian Institute of Technology Madras
Digital Modelling of an Industrial Inline Sputtering System - passing the Turing-Test for a practical application
Timon Belz, Fraunhofer IST
Simulating the Dynamics of Industrial HiPIMS Plasma with a Positive Pulse Using a 2D Hybrid Model
Adam Obrusnik, PlasmaSolve
Enhanced Osseointegration of HiPIMS Titanium Coating on Laser-Textured PEEK for Spinal Implants
Ping-Yen Hsieh, Feng Chia University
Simulation-Based Prediction of SiOx and AlOx Film Properties in a Reactive HiPIMS + RF Deposition
Kristina Tomankova, PlasmaSolve
Electrical Characterization of a Superimposed HiPIMS / RF Deposition Process on a Single Magnetron
Jonas Müller, Fraunhofer IWM
Fraunhofer Institute for Surface Engineering and Thin Films IST