Fraunhofer Institute for Surface Engineering and Thin Films IST
Fraunhofer Institute for Surface Engineering and Thin Films IST
Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

© Fraunhofer IST, Falko Oldenburg

Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

© Fraunhofer IST, Falko Oldenburg

Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

© Fraunhofer IST, Falko Oldenburg

Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

© Fraunhofer IST, Falko Oldenburg

Exterior view of the new machine hall of the Fraunhofer IST.
© Fraunhofer IST, Falko Oldenburg
Exterior view of the new machine hall of the Fraunhofer IST.

© Fraunhofer IST, Falko Oldenburg

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SVC Short Courses

The  Society of Vacuum Coaters is presenting three tutorial courses. Take advantage of learning from these outstanding, internationally recognized instructors and getting answers to your practical vacuum coating problems.

SVC C-310: Sputtering

Monday, June 23, 2025: 08:30 - 16:30

Dr. Ralf Bandorf, Fraunhofer IST, Germany

 

SVC C-323: High Power Impulse Magnetron Sputtering

Monday, June 23, 2025: 08:30 - 16:30

Prof. Arutiun P. Ehiasarian, Sheffield Hallam University, Sheffield, UK

 

SVC C-338: Application of Reactive Sputtering

Tuesday, June 24, 2025: 08:30 - 12:00

Dr. Ralf Bandorf, Fraunhofer IST, Germany

Holger Gerdes, Fraunhofer IST, Germany

 

SVC C-333: HIPIMS Applications

Tuesday, June 24, 2025: 13:00 - 16:30

Dr. Ralf Bandorf, Fraunhofer IST, Germany

Prof. Arutiun P. Ehiasarian, Sheffield Hallam University, Sheffield, UK

 

Conference Program

  Wednesday, JUNE 25 THURSDAY, JUNE 26
8:00 Registration Registration
8:30 Welcome
8:40 I-V-characteristics and drifts – glows, arcs and HiPIMS discharges: A few historical remarks
Holger Kersten
Kiel University, Germany
 Simulating the Dynamics of Industrial HiPIMS Plasma with a Positive Pulse Using a 2D Hybrid Model
Adam Obrusnik
PlasmaSolve s.r.o., Czech Republic
9:00 Time-resolved optical emission spectroscopy of material transport during the sputtering of a compound NbC target by HiPIMS
Andrea Pajdarová
University of West Bohemia in Pilsen, Czech Republic
 New insights into HiPIMS discharges from particle-based simulations
Tomas Kozak
University of West Bohemia in Pilsen, Czech Republic
9:20 Tuning HIPIMS processes in real-time by pulse-resolved spectroscopic and electrical plasma process control
Thomas Schütte
PLASUS GmbH, Germany		 Simulation-Based Prediction of SiOx and AlOx Film Properties in a Reactive HiPIMS + RF Deposition
Kristina Tomankova
PlasmaSolve s.r.o., Czech Republic
9:40 Electrical Characterization of a Superimposed HiPIMS / RF Deposition Process on a Single Magnetron
Jonas Müller
Fraunhofer IWM, Germany		 Digital Modelling of an Industrial Inline Sputtering System - passing the Turing-Test for a practical application
Dennis Barton
Fraunhofer IST, Germany
10:00 Poster Session and Coffee break Poster Session and Coffee break
10:40 Plasma and energy flux diagnostics in HiPIMS discharges
Caroline Adam
Kiel University, Germany		 Optimized HiPIMS-Deposited TiAlSiN Coatings: Tailoring Deposition Parameters for Superior Machining of Inconel 718
Sumit Rajput
Indian Institute of Technology Madras, India
11:00 Probe Measurement Technology for Pulsed Plasma Processes
Moritz Oberberg
House of Plasma GmbH, Germany		 Surface engineering and microbiology – a critical partnership in medicine, the environment and more
Thomas Smith
Sheffield Hallam University, United Kingdom
11:20 Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering
Anas Ghailane
Avaluxe Coating Technologies GmbH & Co KG, Germany		 Phase transition control using Reactive bipolar HiPIMS, application to tantalum nitride and original transition metal nitride alloys
Julien Neyrat
Safran, France
11:40 Robust Antimicrobial Transition Metal Nitride Plasmonic Meta-Arrays
Arutiun P. Ehiasarian
Sheffield Hallam University, UK		 Performance Enhancement of Single layered Brazed cBN Grinding Wheel using HiPIMS-deposited TiAlSiN coating
Bandana Priyadarshini
Indian Institute of Technology Madras, India
12:00 Lunch Lunch
13:40 VO2:W coatings deposited by HIPIMS for electrochromic coatings in Architectural glass for energy saving applications
Stefan Körner
Fraunhofer IST, Germany		 HIPIMS – as an enabler for next steps in tool, decorative and functional applications
Philipp Immich
IHI Hauzer Techno Coating, The Netherlands
14:00 Deposition of Indium Gallium Zinc Oxide film for thin-film transistor by HiPIMS
Takayuki Ohta
Meijo University, Japan		 Characterization of Plasma Properties in Copper Discharge by HIPIMS Under Varying Pulse Parameters
Anna W. Oniszczuk
Trumpf Huettinger Sp. z o.o., Poland
14:20 Alpha-Alumina Thin Films at Low Temperature by Reactive HiPIMS
Celia Dieudonne
Institute of condensate matter of bordeaux, France		 Superior HiPIMS-deposited AlCrN coatings for a wide range of cutting applications
Biljana Mesic
CemeCon AG, Germany
14:40 Tool Life and Quality of Holes in Micro-Drilling of SS316 Steel by HiPIMS-TiAlSiN Coated Carbide Tools
Abhishek Shrivastava
Indian Institute of Technology Madras, India		 Hybrid Cleaning in High-Tech-Coating Processes
Karl Trautz
HEMO GmbH, Germany
15:00 Poster Session and Coffee break Professor Papken Eh. Hovsepian Award
Closing remarks
15:20 End of the conference
15:40 OES-Driven Process Monitoring and Control for Long-Term Stability in Industrial Roll-to-Roll HiPIMS Copper Coating
Ju-Liang He
Feng Chia University, Taiwan		  
16:00 Enhanced Osseointegration of HiPIMS Titanium Coating on Laser-Textured PEEK for Spinal Implants
Ping-Yen Hsieh
Feng Chia University, Taiwan
16:20 Reactive triple-cathode high power impulse magnetron sputtering co-deposition of C–Cr–Zr films
Yu-Tang Yin
National Formosa University, Taiwan
16:40 Effect of Sputtering Peak Power Density on the Adhesion of Titanium Coatings on PET Substrates via HiPIMS
Ying-Hung Chen
Feng Chia University, Taiwan
17:00 Coffee break and Company Tour
18:00 End of the first conference day
19:30 Conference Dinner
Steigenberger Parkhotel Braunschweig,
Nimes-Str. 2, 38100 Braunschweig

 

Poster Session

 

P1 HiPIMS Deposition of Tunable Bandgap TiO2 for Flexible Photovoltaics
Sheng-Kuei Chiu
Feng Chia University, Taiwan
P2 Influence of bilayer thickness on surface morphology, optical properties of TiN/NbN multilayer coatings deposited by HIPIMS
Arunprabhu Arunachalam Sugumaran
Sheffield Hallam University, UK